In-Situ GIXRD Characterization of the Crystallization of Ni-Ti Sputtered Thin Films


Article Preview



Materials Science Forum (Volumes 455-456)

Edited by:

Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias




R. M. S. Martins et al., "In-Situ GIXRD Characterization of the Crystallization of Ni-Ti Sputtered Thin Films", Materials Science Forum, Vols. 455-456, pp. 342-345, 2004

Online since:

May 2004




[1] Committee on Advanced Materials and Fabrication Methods for Microelectromechanical Systems: Microelectromechanical systems, advanced materials and fabrication methods (National Materials Advisory Board, National Academy Press, Washington, D.C. 1997).

DOI: 10.17226/5977

[2] F.M. Braz Fernandes, R. Martins, M. ª T. Nogueira, R.J.C. Silva, P. Nunes, D. Costa, I. Ferreira, R. Martins: Sensors and Actuators Vol. 99/1-2 (2002), p.53.

[3] L. Pereira, H. Águas, R. Miguel Martins, F. Braz Fernandes, E. Fortunato, R. Martins: Physics and Application of Disordered Materials, edited by Popescu Mihai (2002), p.373.

[4] F.M. Braz Fernandes, R.M.S. Martins, R.J.C. Silva, A. Marques, R. Martins: Project-Group ESRF-Beamline (ROBL-CRG), Bi-Annual Activity Report, 2001/2002, FZR-364 (2003), Rossendorf, p.11.

[5] W. Matz, N. Schell, G. Bernhard, F. Prokert, T. Reich, J. Clauβner, et al.: Journal of Synchrotron Radiation Vol. 6 (1999), p.1076.

[6] Y.Q. Yang, H.S. Jia, Z.F. Zhang, H.M. Shen, A. Hu, Y.N. Wang: Materials Letters Vol. 22 (1995), p.137.

Fetching data from Crossref.
This may take some time to load.