In-Situ GIXRD Characterization of the Crystallization of Ni-Ti Sputtered Thin Films

Abstract:

Article Preview

Info:

Periodical:

Materials Science Forum (Volumes 455-456)

Edited by:

Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias

Pages:

342-345

DOI:

10.4028/www.scientific.net/MSF.455-456.342

Citation:

R. M. S. Martins et al., "In-Situ GIXRD Characterization of the Crystallization of Ni-Ti Sputtered Thin Films", Materials Science Forum, Vols. 455-456, pp. 342-345, 2004

Online since:

May 2004

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.