H-Induced Si-Rich 3C-Si(100) 3x2 Surface Metallization


Article Preview



Materials Science Forum (Volumes 457-460)

Edited by:

Roland Madar, Jean Camassel and Elisabeth Blanquet




M. D'Angelo et al., "H-Induced Si-Rich 3C-Si(100) 3x2 Surface Metallization", Materials Science Forum, Vols. 457-460, pp. 399-402, 2004

Online since:

June 2004




[1] K. Oura, V.G. Lifshits, A.A. Saranin, A.V. Zotov and M. Katayama, Surf. Sci. Rep. 35, 1 (1999).

[2] G.S. Higashi and Y.J. Chabal, Handbook of silicon wafer cleaning technology: science, technology, and applications, W. Kern Editor, Noyes Publications, Park Ridge, NJ, U.S.A., 433 (1993).

[3] J.J. Boland, Phys. Rev. Lett. 65, 3325 (1990).

[4] V. Derycke, P. Fonteneau, N.P. Pham and P. Soukiassian, Phys. Rev. B 63, Rap. Com., R 201305 (2001).

[5] H.W. Yeom, Y.C. Chao, I. Matsuda, S. Hara, S. Yoshida and R.I.G. Uhrberg, Phys. Rev. B 58, 10540 (1998).

[6] V. Derycke, P. Soukiassian, F. Amy, Y.J. Chabal, M. D'angelo, H. Enriquez and M. Silly, Nature Materials 2, 253 (2003).

[7] M. D'angelo, H. Enriquez, V. Yu. Aristov, P. Soukiassian, G. Renaud, A. Barbier, M. Noblet, S. Chiang and F. Semond, Phys. Rev. B 68, 165321 (2003).

[8] F. Semond, P. Soukiassian, A.J. Mayne, G. Dujardin, L. Douillard and C. Jaussaud, Phys. Rev. Lett. 77, 2013 (1997).

DOI: https://doi.org/10.1103/physrevlett.77.2013

[9] W. Lu, P. Krüger and J. Pollmann, Phys. Rev. B 60, 2495 (1999).

[10] Marie D'angelo, PhD Thesis, Université de Paris-Sud/Orsay, N° 7247, 9 July (2003).