Electro-Chemical Mechanical Polishing of Silicon Carbide


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Materials Science Forum (Volumes 457-460)

Edited by:

Roland Madar, Jean Camassel and Elisabeth Blanquet




C. H. Li et al., "Electro-Chemical Mechanical Polishing of Silicon Carbide", Materials Science Forum, Vols. 457-460, pp. 801-804, 2004

Online since:

June 2004




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[10] E.I. Radovanova: Semiconductors 30 (1996)527. 0. 1 1 10 0 5 10 15 20 25 5 seconds 30 seconds 0. 1µm diamond polish As received wafer Anodization Current (mA) RMS Roughness (nm) Fig. 5 RMS roughnesses as a function of anodization current.

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