Etching of SiC with Fluorine ECR Plasma

Abstract:

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Periodical:

Materials Science Forum (Volumes 457-460)

Edited by:

Roland Madar, Jean Camassel and Elisabeth Blanquet

Pages:

821-824

DOI:

10.4028/www.scientific.net/MSF.457-460.821

Citation:

C. Förster et al., "Etching of SiC with Fluorine ECR Plasma", Materials Science Forum, Vols. 457-460, pp. 821-824, 2004

Online since:

June 2004

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$35.00

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