Boron Diffusion in Intrinsic, n-Type and p-Type 4H-SiC

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Periodical:

Materials Science Forum (Volumes 457-460)

Edited by:

Roland Madar, Jean Camassel and Elisabeth Blanquet

Pages:

917-920

DOI:

10.4028/www.scientific.net/MSF.457-460.917

Citation:

M. K. Linnarsson et al., "Boron Diffusion in Intrinsic, n-Type and p-Type 4H-SiC", Materials Science Forum, Vols. 457-460, pp. 917-920, 2004

Online since:

June 2004

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