Growth of Hg1-x(Cd1-yZny)xTe on Si(111) by Isothermal Vapor Phase Epitaxy

Abstract:

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The quaternary HgCdZnTe (MCZT) epilayer was successfully grown on lattice matched Cd0.96Zn0.04Te/Si(111) substrates using isothermal vapor phase epitaxy (ISOVPE) method. It was found that Si wafer is an excellent barrier against Hg and Cd diffusion. Cross-sectional images reveal a flat and well-distinguished interface between MCZT and Si, and voids formed due to interdiffusion was not observed in MCZT layer above the Si wafer. It was demonstrated that it was possible to yield an almost homogeneous MCZT epilayer without compositional gradient by selecting suitable growth time.

Info:

Periodical:

Materials Science Forum (Volumes 475-479)

Main Theme:

Edited by:

Z.Y. Zhong, H. Saka, T.H. Kim, E.A. Holm, Y.F. Han and X.S. Xie

Pages:

1729-1732

DOI:

10.4028/www.scientific.net/MSF.475-479.1729

Citation:

J.F. Wang et al., "Growth of Hg1-x(Cd1-yZny)xTe on Si(111) by Isothermal Vapor Phase Epitaxy", Materials Science Forum, Vols. 475-479, pp. 1729-1732, 2005

Online since:

January 2005

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$35.00

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