Optical and Electrical Properties of Transparent Conductive ITO Thin Films under Proton Radiation with 100 keV

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Under the simulation environment for the vacuum and heat sink in space, the changes in optical and electrical properties of transparent conductive indium tin oxide (ITO) thin films induced by radiation of protons with 100 keV were studied. The ITO thin films were deposited on JGS1 quartz substrate by a sol-gel method. The sheet resistance and transmittance spectra of the ITO thin films were measured using the four-point probe method and a spectrophotometer, respectively. The surface morphology was analyzed by AFM. The experimental results showed that the electrical and optical performances of the ITO thin films were closely related to the irradiation fluence. When the fluence exceeded a given value 2×1016 cm-2, the sheet resistance increased obviously and the optical transmittance decreased. The AFM analysis indicated that the grain size of the ITO thin films diminished. The studies about the radiation effect on ITO thin films will help to predict performance evolution of the second surface mirrors on satellites under space radiation environment.

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Periodical:

Materials Science Forum (Volumes 475-479)

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Edited by:

Z.Y. Zhong, H. Saka, T.H. Kim, E.A. Holm, Y.F. Han and X.S. Xie

Pages:

3697-3700

Citation:

Q. Wei et al., "Optical and Electrical Properties of Transparent Conductive ITO Thin Films under Proton Radiation with 100 keV", Materials Science Forum, Vols. 475-479, pp. 3697-3700, 2005

Online since:

January 2005

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$38.00

[1] A.I. Akishiu: Effects of Space Conditions on Materials (Nova Science Publishers, Inc., New York 2001).

[2] G.Z. Chen and G.C. Lin: Chinese Space Science and Technology No. 6 (1994), p.43.

[3] S. Czepiela, D. Hastings and H. McManus: American Institute of Aeronautics and Astronautics, AIAA 97-0629, pp.1-9.

[4] Y.S. Lu, Y.D. Feng, H.M. Zhai and Y. Wang: Chinese Journal of Space Science, Vol. 19 (1999), p.375.

[5] M.J. Alam, D.C. Cameron: Thin Solid Films Vol. 420-421 (2002), p.76.

[6] K. Nishio, T. Sei and T. Tsuchiya: J. Mat. Sci. Vol. 31 (1996), p.1761.

[7] Y. Djaoued, V.H. Phong, S. Badilescu, P.V. Ashrit, F.E. Girouard and V.V. Truong: Thin Solid Films Vol. 293 (1997), p.108.

DOI: https://doi.org/10.1016/s0040-6090(96)09060-8

[8] K.L. Chopar, S. Major and D.K. Pandya: Thin Solid Films Vol. 102 (1983), p.1.

[9] D.M. Mattox: Thin Solid Films Vol. 204 (1991), p.25.

[10] H. Wulff, M. Quaas and H. Steffen: Thin Solid Films Vol. 355-356 (1999), p.395.

[11] P. Thilakan, S. Kalainathan, J. Kumar and P. Ramssamy: J. Electron. Mater. Vol. 24 (1995), p.719.

[12] Z.B. Zhou, Y.Z. Zhang, L.K. Zhang and X.Z. Du: Journal of Anhui Normal University (Natural Science) Vol. 18 (1995), p.66.

[13] T. Furusaki and K. Kodaira: High Perform. Ceram. Films Coat. Vol. 1 (1991), p.241.

[14] T. H. Chang: Aerospace Shanghai No. 6 (2002), p.51.

[15] V.V. Abraimov, Y.S. Qin, H.S. Yu, Y.D. Zhuang, L.K. Kolybaev, E.T. Verkhovtseva, V.F. Rybalko, I.M. Nekludov, V.I. Yaremenko and A.S. Zaika: The FiFth Sino-Russian-Ukrainian Symposium on Space Science and Technology Held Jointly With The First International Forum on Astronautics and Aeronautics. (Harbin Institute of Technology, Harbin, P. R. China, 2000), p.700.

[16] S.G. Zhang, B.Y. Huang and X.H. Fang: Materials Review Vol. 11 (1997), p.11.

[17] S. -S. Kim, S. -Y. Choi, C. -G. Park and H. -W. Jin: Thin Solid Films Vol. 347 (1999), p.155.

[18] I. Hamberg and C.G. Granqvist: J. Appl. Phys. Vol. 60 (1980), p.123.

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