Magnetic-Transport and Microstructure of FeNi-Cu Nanogranular Films

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A series of (Fe50Ni50)xCu1-x granular films were prepared using magnetron controlled sputtering method. The magnetic-transport and microstructure of FeNi-Cu films deposited at room temperature and then annealed at various temperatures were investigated through TEM, XRD and conventional four probes method under room temperature, respectively. The giant magnetoresistence (GMR) as a function of FeNi volume fraction for as-deposited FeNi-Cu films reached a maximum of about 1.8 % at the volume fraction of 32 %. With increasing the annealing temperature, the GMR of films with the volume fraction less than 26 % reaches a peak at certain annealing temperature. While for films with the volume fraction larger than 26 %, the GMR have almost no changes at first and then decrease with increasing the annealing temperature. In addition, the relationship between magneto-transport and the microstructure, morphology of granular films is discussed.

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Periodical:

Materials Science Forum (Volumes 475-479)

Main Theme:

Edited by:

Z.Y. Zhong, H. Saka, T.H. Kim, E.A. Holm, Y.F. Han and X.S. Xie

Pages:

3733-3736

Citation:

C. Z. Wang et al., "Magnetic-Transport and Microstructure of FeNi-Cu Nanogranular Films", Materials Science Forum, Vols. 475-479, pp. 3733-3736, 2005

Online since:

January 2005

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$38.00

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