Preparation of Oriented Fe2O3 Film on Glass/Si Substrate by Atmospheric MOCVD

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In recent years, much work has been done on microwave absorbing materials, and anisotropy magnetic materials are expected to have excellent microwave absorbing properties. We have prepared well-aligned ZnO whiskers on glass substrate by atmospheric MOCVD. In the present work, Fe2O3 film is deposited by this technique. The phase composition, orientation and morphology of deposited products are studied by XRD and SEM. The effects of the deposition conditions (such as vaporizing temperature, substrate temperature, distance from nozzle to substrate, and carrier gas flux) are investigated. The optimal conditions for the preparation of orientated Fe2O3 film and even well-aligned whisker array are discussed.

Info:

Periodical:

Materials Science Forum (Volumes 475-479)

Main Theme:

Edited by:

Z.Y. Zhong, H. Saka, T.H. Kim, E.A. Holm, Y.F. Han and X.S. Xie

Pages:

3749-3752

DOI:

10.4028/www.scientific.net/MSF.475-479.3749

Citation:

J. Cheng and Y. Zhang, "Preparation of Oriented Fe2O3 Film on Glass/Si Substrate by Atmospheric MOCVD", Materials Science Forum, Vols. 475-479, pp. 3749-3752, 2005

Online since:

January 2005

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$35.00

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