Ultra-Hard Nanostructured Al-Si Thin Films

Abstract:

Article Preview

We show that it is possible to use high rate co-evaporation of Al and Si onto room temperature substrates to achieve a novel two-phase nanoscale microstructure. These nanocomposites have a hardness as high as 4GPa (Al-23at.%Si), and display noticeable plasticity. Films with compositions of Al-12at.%Si and pure Al (used as baseline) were analyzed using transmission electron microscopy (TEM). The scale of the Al-12at.%Si microstructure is an order of magnitude finer compared to that of pure Al films. It consists of a dense distribution of spherical nanoscale Si particles separating irregularly-shaped small Al grains. These new structures may have a mechanical performance advantage over conventional single phase nanomaterials due to the role of the dispersed hard phase in promoting strain hardening.

Info:

Periodical:

Edited by:

Dragan P. Uskokovic, Slobodan K. Milonjic, Djan I. Rakovic

Pages:

13-18

DOI:

10.4028/www.scientific.net/MSF.494.13

Citation:

V. Radmilović et al., "Ultra-Hard Nanostructured Al-Si Thin Films", Materials Science Forum, Vol. 494, pp. 13-18, 2005

Online since:

September 2005

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.