Fabrication of Nano-Sized Gold Dot Array Using Bi-Layer Nano Imprint Lithography

Abstract:

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UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.

Info:

Periodical:

Materials Science Forum (Volumes 510-511)

Edited by:

Hyung Sun Kim, Yu Bao Li and Soo Wohn Lee

Pages:

446-449

DOI:

10.4028/www.scientific.net/MSF.510-511.446

Citation:

K. Y. Yang et al., "Fabrication of Nano-Sized Gold Dot Array Using Bi-Layer Nano Imprint Lithography", Materials Science Forum, Vols. 510-511, pp. 446-449, 2006

Online since:

March 2006

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Price:

$35.00

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