Fabrication of Nano-Sized Gold Dot Array Using Bi-Layer Nano Imprint Lithography
UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.
Hyung Sun Kim, Yu Bao Li and Soo Wohn Lee
K. Y. Yang et al., "Fabrication of Nano-Sized Gold Dot Array Using Bi-Layer Nano Imprint Lithography", Materials Science Forum, Vols. 510-511, pp. 446-449, 2006