Influence of the Crystallographic Orientation on the Mechanical Behaviour of Sputtered Silver Thin Films

Abstract:

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In this research work, sputtering was used to deposit silver thin films under different deposition parameters, namely by changing deposition pressure, substrate bias and discharge gas. The main objective of the present work was to study the influence of the textured grain in the mechanical behaviour of the modified surfaces. The deposition rate, chemical composition (EPMA), morphology (SEM) and hardness were also assessed. In the slide alternating wear tests, where poly(tetrafluoroethylene) (PTFE) was used as counterbody, the loads varied from 10 to 30 N. One of the major conclusions of this work is that the thin films with the strongest (111) preferential crystallographic orientation correspond to the highest deposition rate. These sample present higher hardness and lower wear coefficient if compared with other orientations

Info:

Periodical:

Materials Science Forum (Volumes 514-516)

Edited by:

Paula Maria Vilarinho

Pages:

1140-1144

DOI:

10.4028/www.scientific.net/MSF.514-516.1140

Citation:

A. P. Piedade et al., "Influence of the Crystallographic Orientation on the Mechanical Behaviour of Sputtered Silver Thin Films", Materials Science Forum, Vols. 514-516, pp. 1140-1144, 2006

Online since:

May 2006

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$35.00

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