Optical Emission Spectroscopy Study of Magnetron Assisted Ni-Ti DC Sputtering
Ni-Ti thin films where the R-phase transformation occurs between 55°C and 30°C, the peak temperature being 40°C, have been produced. These thin films have been grown using a magnetron assisted system of dc sputtering, with a Glow-Discharge Optical Emission Spectroscopy device. The OES technique has been used to investigate the spatial distribution of sputtered atoms from the cathode to the substrate in different operating conditions: Argon pressure of 5 and 9x10 – 4 Torr, without polarization and with – 60 V bias. Structural characterization of the thin films has been made by XRD and the transformation temperatures associated to the shape memory effect have been determined by DSC. A discussion of the optimization of the processing parameters (Argon pressure and polarization) is then presented.
Paula Maria Vilarinho
M. Silva, P. R. Gordo, M. J.P. Maneira, F. M. Braz Fernandes, "Optical Emission Spectroscopy Study of Magnetron Assisted Ni-Ti DC Sputtering", Materials Science Forum, Vols. 514-516, pp. 1274-1278, 2006