Optical Emission Spectroscopy Study of Magnetron Assisted Ni-Ti DC Sputtering

Abstract:

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Ni-Ti thin films where the R-phase transformation occurs between 55°C and 30°C, the peak temperature being 40°C, have been produced. These thin films have been grown using a magnetron assisted system of dc sputtering, with a Glow-Discharge Optical Emission Spectroscopy device. The OES technique has been used to investigate the spatial distribution of sputtered atoms from the cathode to the substrate in different operating conditions: Argon pressure of 5 and 9x10 – 4 Torr, without polarization and with – 60 V bias. Structural characterization of the thin films has been made by XRD and the transformation temperatures associated to the shape memory effect have been determined by DSC. A discussion of the optimization of the processing parameters (Argon pressure and polarization) is then presented.

Info:

Periodical:

Materials Science Forum (Volumes 514-516)

Edited by:

Paula Maria Vilarinho

Pages:

1274-1278

DOI:

10.4028/www.scientific.net/MSF.514-516.1274

Citation:

M. Silva, P. R. Gordo, M. J.P. Maneira, F. M. Braz Fernandes, "Optical Emission Spectroscopy Study of Magnetron Assisted Ni-Ti DC Sputtering", Materials Science Forum, Vols. 514-516, pp. 1274-1278, 2006

Online since:

May 2006

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$35.00

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