In Situ Observation of Ni-Ti Thin Film Growth by Synchrotron Radiation Scattering


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A sputter deposition chamber inserted into the six-circle Huber diffractometer of the materials research station of the ROssendorf BeamLine (ROBL-CRG) at ESRF allowed to perform in-situ experiments during film growth of Ni-Ti. It is equipped with Kapton windows for X-Ray Diffraction (XRD) and specular Reflectivity (XRR) measurements. By following in situ the evolution of the structure of the growing film, we reveal intermediate “states” which cannot be seen/revealed ex situ, because those states occurred only during the growth but were no longer visible after deposition. Vertical Bragg-Brentano large-angle scattering geometry was employed to study the different trends of structural transformations taking place during deposition. Ni-Ti films exhibiting a non-uniform phase content across the film thickness could be produced by varying the power of co-sputtering Ni-Ti plus Ti. A significant decrease of IB2{110}/IB2{200} was observed when a bias of -45 V was applied.



Materials Science Forum (Volumes 514-516)

Edited by:

Paula Maria Vilarinho




R. M. S. Martins et al., "In Situ Observation of Ni-Ti Thin Film Growth by Synchrotron Radiation Scattering", Materials Science Forum, Vols. 514-516, pp. 1588-1592, 2006

Online since:

May 2006




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