In Situ Observation of Ni-Ti Thin Film Growth by Synchrotron Radiation Scattering

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A sputter deposition chamber inserted into the six-circle Huber diffractometer of the materials research station of the ROssendorf BeamLine (ROBL-CRG) at ESRF allowed to perform in-situ experiments during film growth of Ni-Ti. It is equipped with Kapton windows for X-Ray Diffraction (XRD) and specular Reflectivity (XRR) measurements. By following in situ the evolution of the structure of the growing film, we reveal intermediate “states” which cannot be seen/revealed ex situ, because those states occurred only during the growth but were no longer visible after deposition. Vertical Bragg-Brentano large-angle scattering geometry was employed to study the different trends of structural transformations taking place during deposition. Ni-Ti films exhibiting a non-uniform phase content across the film thickness could be produced by varying the power of co-sputtering Ni-Ti plus Ti. A significant decrease of IB2{110}/IB2{200} was observed when a bias of -45 V was applied.

Info:

Periodical:

Materials Science Forum (Volumes 514-516)

Edited by:

Paula Maria Vilarinho

Pages:

1588-1592

DOI:

10.4028/www.scientific.net/MSF.514-516.1588

Citation:

R. M. S. Martins et al., "In Situ Observation of Ni-Ti Thin Film Growth by Synchrotron Radiation Scattering", Materials Science Forum, Vols. 514-516, pp. 1588-1592, 2006

Online since:

May 2006

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$38.00

[1] K. Otsuka and T. Kakeshita: MRS Bulletin Vol. 27 (2) (2002), p.91.

[2] K. Otsuka, T. Sawamura and K. Shimizu: Phys. Stat. Sol. A Vol. 5 (1971), p.457.

[3] Y. C. Shu and K. Bhattacharya: Acta mater. Vol. 46 (15) (1998), p.5457.

[4] B. Winzek, S. Schmitz, H. Rumpf, T. Sterzl, R. Hassdorf, S. Thienhaus, J. Feydt, M. Moske and E. Quandt: Mater. Sci. Eng. A Vol. 378 (2004), p.40.

DOI: 10.1016/j.msea.2003.09.105

[5] A. Ishida and V. Martynov: MRS Bulletin Vol. 27 (2) (2002), p.111.

[6] Y. Fu, H. Du, W. Huang, S. Zhang and M. Hu: Sens. Actuators A Vol. 112 (2004), p.395.

[7] H. Lee and A. Ramirez: Appl. Phys. Lett. Vol. 85 (7) (2004), p.1146.

[8] R.M.S. Martins, R.J.C. Silva, F.M. Braz Fernandes, L. Pereira, P.R. Gordo, M.J.P. Maneira and N. Schell: Mater. Sci. Forum Vol. 455-456 (2004), p.342.

[9] W. Matz, N. Schell, W. Neumann, J. Bøttiger and J. Chevallier: Rev. Sci. Instrum. Vol. 72 (2001), p.3344.

[10] http: /www. esrf. fr/computing/scientific/xop/download. html.

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