Isothermal Oxidation of Sintered β-FeSi2 in Air

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High-temperature oxidation of sintered β-FeSi2 doped with Mn and Co was evaluated at 800°C in air. Amorphous SiO2 was developed as an oxide scale. Granular ε-FeSi also appeared below the SiO2 scale as a result of consumption of Si in β-FeSi2. Growth of the oxide scale on doped FeSi2 followed a parabolic law and its rate was similar to oxidation of undoped samples. Thermoelectric properties of sintered β-FeSi2 were also evaluated before and after oxidation at 800°C for 7 days. There was no significant change in thermoelectric properties after high-temperature oxidation on β-FeSi2 sintered bodies.

Info:

Periodical:

Materials Science Forum (Volumes 522-523)

Edited by:

Shigeji Taniguchi, Toshio Maruyama, Masayuki Yoshiba, Nobuo Otsuka and Yuuzou Kawahara

Pages:

641-648

DOI:

10.4028/www.scientific.net/MSF.522-523.641

Citation:

M. Nanko et al., "Isothermal Oxidation of Sintered β-FeSi2 in Air", Materials Science Forum, Vols. 522-523, pp. 641-648, 2006

Online since:

August 2006

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$35.00

[1] R. M. Ware and D. J. McNeill, Proc. IEE, Vol. 111 (1964), p.178.

[2] I. A. Nishida: Thermoelectrics -Principles and Applications-, ed by M. Sakata (Realize Inc., Tokyo, 2001), p.199.

[3] T. Kanda, M. Mukojima, I. Aoyama and H. Ishimabushi, Kinzoku, Vol. 74 (2004), p.793.

[4] L. Stolt, O. Thomas and F. M. d'Heurle: J. Appl. Phys., Vol. 68 (1990), p.5133.

[5] N. Lundberg, U. Erlesand and M. Östling: Advanced Metallization and Processing for Semiconductor Devices and Circuits II, Mat. Res. Soc. Symp. Proc. 260, ed by A. Katz, S. P. Murarka, Y. I. Nissim, J. M.E. Harper (Materials Research Society, 1992) p.417.

[6] S. H. Chang, M. Nanko, K. Matsumaru, K. Ishizaki and M. Takeda: J. Jpn. Inst. Met., Vol. 80 (2006), in-press.

[7] M. Bartur and M-A. Nicolet: Appl. Phys. Lett., Vol. 40 (1982), p.175.

[8] W. J. Strydom and J. C. Lombaard: Thin Solid Films. Vol. 131 (1985), p.215.

[9] B. E. Deal and A. S. Grove: J. Appl. Phys., Vol. 36 (1965), p.3770.

[10] S. W. Kim, M. K. Cho, Y. Mishima, D. C. Choi: Intermetall., Vol. 11 (2003), p.399.

[11] Y. Isoda, Y. Imai and Y. Shinohara: J. Jpn. Inst. Met., Vol. 67 (2003), p.410.

[12] S. Asanabe, D. Shinoda and Y. Sasaki: Phys. Rev., Vol. 134 (1964), p.774.

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