X-Ray Diffraction Analysis of Nonuniform Residual Stress Fields σii(τ) under Difficult Conditions

Abstract:

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Thin hard coatings for wear protection usually do not consist of single layers but of stacks of alternating sublayers which have to meet different demands. With respect to X-ray residual stress analysis (XSA) such multilayer systems pose a series of challenges. In addition to those problems which generally arise in thin film diffraction like small layer thickness or strong texture, neighbouring sublayers with similar chemical composition may superimpose each other, or sublayers of identical structure and composition, which contribute to the same diffraction line, are separated by other sublayers. Starting from a formalism that yields the X-ray penetration depth τ in multilayer systems of arbitrary sublayer sequences, we show how a combination of measurements using ‘conventional’ photon sources available at any X-ray lab and synchrotron radiation allowing for wavelength tuning near the TiKβ absorption edge, can be used to evaluate the residual stress state in the top sublayer stack of a hard coating multilayer system deposited by chemical vapour deposition.

Info:

Periodical:

Materials Science Forum (Volumes 524-525)

Edited by:

W. Reimers and S. Quander

Pages:

601-606

DOI:

10.4028/www.scientific.net/MSF.524-525.601

Citation:

M. Klaus et al., "X-Ray Diffraction Analysis of Nonuniform Residual Stress Fields σii(τ) under Difficult Conditions", Materials Science Forum, Vols. 524-525, pp. 601-606, 2006

Online since:

September 2006

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Price:

$35.00

[1] S. G. Lekhnitskii: Anisotropic Plates. Gordon and Breach Science Publ., New York, (1968).

[2] I. C. Noyan, T. C. Huang and B. R. York: Crit. Rev. Solid State Mater. Sci. 20 (1995), 125.

[3] Ch. Genzel: in: P. Scardi and E. J. Mittemeijer (Eds. ): Diffraction Analysis of the Microstructure of Materials. Springer Series in Materials Science, Volume 68, 2004, pp.473-503.

[4] M. Birkholz: Thin Film Analysis by X-Ray Scattering. Wiley, 2005, ISBN 3-527-31052-5.

[5] H. Dosch: Phys. Rev. B 35 (1987), 2137.

[6] Ch. Genzel: Mat. Sci. Technol., 21 (2005), 10.

[7] V. Hauk: Structural and Residual Stress Analysis by Nondestructive Methods, Elsevier, Amsterdam, (1997).

[8] U. Welzel, J. Ligot, P. Lamparter, A. C. Vermeulen and E. J. Mittemeijer: J. Appl. Cryst. 38 (2005), 1.

[9] I. A. Denks, M. Klaus and Ch. Genzel: Elsewhere in these proceedings.

[10] M. Klaus: in preparation. Fig. 7 Depth-resolved XSA on basis of the sin²ψ method in a CVD multilayer system. Thickness and arrangement of the sublayers are the same as in Fig. 6. The analysed reflexions are marked in the Figure. 116 300 006 200 200 200 220 311.

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