High Epitaxial Growth Rate of 4H-SiC Using Horizontal Hot-Wall CVD


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A 4H-SiC epitaxial growth process has been developed in a horizontal hot-wall CVD reactor using a standard chemistry of silane-propane-hydrogen, producing repeatable growth rates up to 32 μm/h. The growth rate was studied as a function of pressure, silane flow rate, and growth time. The structural quality of the films was determined by X-ray diffraction. A 65 μm thick epitaxial layer was grown at the 32 μm/h rate, resulting in a smooth, specular film morphology with occasional carrot-like and triangular defects. The film proved to be of high structural quality with an X-ray rocking curve FWHM value of the (0004) peak of 11 arcseconds.



Materials Science Forum (Volumes 527-529)

Edited by:

Robert P. Devaty, David J. Larkin and Stephen E. Saddow




R. L. Myers-Ward et al., "High Epitaxial Growth Rate of 4H-SiC Using Horizontal Hot-Wall CVD", Materials Science Forum, Vols. 527-529, pp. 187-190, 2006

Online since:

October 2006




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