Thermodynamic Analysis of Synthetic Potentialities of the nSiC + SiO2 Starting System: SiC Gas-Phase Transport via Si(g) and CO(g)

Abstract:

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The major objective of our studies was the thermodynamic analysis of the nSiС+SiO2 system and revealing potentialities for the implementation of the SiC gas-phase transport conditions. As a result of thermodynamic scanning of the chemical activity of nSiС+SiO2 system the conditions for implementing the SiC gas-phase transport were found out within a wide temperature range. It was found out that the basic process in the gas-phase transport of silicon carbide is: SiCs + SiOg→ 2Sig + СОg SiC evaporation at T2 2Sig + СОg → SiCnanowhiskers + SiOg SiC deposition at T1 Sequential evaporation and deposition of silicon carbide result in the growth of SiC crystals from a gas phase. The processes of SiC gas-phase transport and deposition were experimentally realized. Synthesized were SiC nanocrystals over 300 μm long, ~ 300 nm in diameter that forms a three-dimensional subskeleton inside the carbon skeleton.

Info:

Periodical:

Materials Science Forum (Volumes 527-529)

Edited by:

Robert P. Devaty, David J. Larkin and Stephen E. Saddow

Pages:

775-778

DOI:

10.4028/www.scientific.net/MSF.527-529.775

Citation:

V.G. Sevastyanov et al., "Thermodynamic Analysis of Synthetic Potentialities of the nSiC + SiO2 Starting System: SiC Gas-Phase Transport via Si(g) and CO(g)", Materials Science Forum, Vols. 527-529, pp. 775-778, 2006

Online since:

October 2006

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$35.00

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