Post-Implantation Annealing in a Silane Ambient Using Hot-Wall CVD

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Post-implant annealing of Al implanted 4H-SiC has been performed in the temperature range from 1600°C to 1750°C. Annealing was conducted in a hot-wall CVD reactor using a silanerich ambient. Ar was used as the carrier gas to deliver the silane to the annealing zone where the sample was heated via RF induction. The resulting annealed surfaces exhibited a step-bunch free, smooth morphology when viewed on SEM and AFM. The maximum surface roughness as measured via AFM was 0.65 nm RMS for the sample annealed at 1750°C.

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Periodical:

Materials Science Forum (Volumes 527-529)

Edited by:

Robert P. Devaty, David J. Larkin and Stephen E. Saddow

Pages:

839-842

Citation:

S. P. Rao et al., "Post-Implantation Annealing in a Silane Ambient Using Hot-Wall CVD", Materials Science Forum, Vols. 527-529, pp. 839-842, 2006

Online since:

October 2006

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$38.00

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