Study Morphology Transitions in Self-Assembled Triblock Copolymer Thin Films with Nanostructures by AFM

Abstract:

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As a “bottom-up” approach to nanostructures for nanofabrication, self-assembled block copolymer thin films have received much attention not only thanks to the scale of the microdomains but also due to the convenient shape tunability. In order to realize applications of self-assembled block copolymer thin films in nanotechnologies, control over microdomain spatial and orientational order is paramount. In this paper, using atomic force microscopy (AFM), we studied systemically nanostructure transitions induced by post-solvent annealing in self-assembled block copolymer thin films. Furthermore, a variety of thin films with well-ordered nanostructures, which can be employed as templates for nanotechnologies, have been realized simply and at low cost.

Info:

Periodical:

Materials Science Forum (Volumes 532-533)

Edited by:

Chengyu Jiang, Geng Liu, Dinghua Zhang and Xipeng Xu

Pages:

165-168

DOI:

10.4028/www.scientific.net/MSF.532-533.165

Citation:

Y. Z. Cao et al., "Study Morphology Transitions in Self-Assembled Triblock Copolymer Thin Films with Nanostructures by AFM", Materials Science Forum, Vols. 532-533, pp. 165-168, 2006

Online since:

December 2006

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Price:

$35.00

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