Parameters Optimization on the Lapping Process for Advanced Ceramics by Applying Taguchi Method

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The surface quality is a critical factor affecting the performance and reliability of advanced ceramics. This paper focuses on the application of Taguchi method for optimization of advanced ceramics lapping process parameters to obtain the best finish. An optimization experiment for lapping silicon wafer with Al2O3 was designed by Taguchi method. Surface roughness Ra and Rt are considered as criteria for optimization. Influence of parameters involving load, speed, and slurry concentration for a given workmaterial with given abrasive (material and size) are discussed, and the optimum lapping conditions are figured out. Compared with single parameter experimental results, it illustrates that the experiment design based on Taguchi method can successfully applied to determine the optimum processing conditions for advanced ceramics lapping process.

Info:

Periodical:

Materials Science Forum (Volumes 532-533)

Edited by:

Chengyu Jiang, Geng Liu, Dinghua Zhang and Xipeng Xu

Pages:

488-491

Citation:

J. L. Yuan et al., "Parameters Optimization on the Lapping Process for Advanced Ceramics by Applying Taguchi Method", Materials Science Forum, Vols. 532-533, pp. 488-491, 2006

Online since:

December 2006

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$38.00

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