Fabrication of Sputtered TiO2-XNX Photocatalyst Using Spark Plasma Sintered Targets


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Materials Science Forum (Volumes 539-543)

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T. Chandra, K. Tsuzaki, M. Militzer , C. Ravindran




S. J. Kim et al., "Fabrication of Sputtered TiO2-XNX Photocatalyst Using Spark Plasma Sintered Targets", Materials Science Forum, Vols. 539-543, pp. 3562-3567, 2007

Online since:

March 2007




[1] T. Tanaka and K. Kawabata, Preparation of TiNx thin films using r. f. -d. c. coupled magnetron sputtering in Ar-N2 gas plasma , Thin Solid Films, Volume 317, Issues 1-2, 1 April 1998, Pages 93-95.

DOI: https://doi.org/10.1016/s0040-6090(97)00605-6

[2] S.U. M Khan., M. Al-Shahry,. W.B. Jr. Ingler, (2002), � Efficient photochemical water splitting by a chemically modified n-TiO2, Science (Washington, DC, United States), Vol. 297, No. 5590, pp.2243-2245.

DOI: https://doi.org/10.1126/science.1075035

[3] C. Burda, Y.B. Lou, X.B. Chen, A.C.S. Samia, J. Stout and J.L. Gole, (2003), Enhanced Nitrogen Doping in TiO2 Nanoparticles, Nano Letters, Vol. 3, No. 8, pp.1049-1051.

DOI: https://doi.org/10.1021/nl034332o

[4] Y. Suda, H. Kawasaki, T. Ueda, T. Ohshima(2002), � Preparation high quality nitrogen doped TiO2 thin film as a photocatalyst using a pulsed laser deposition method, Thin Solid Films, Vol. 415, No. 1, pp.15-20.

DOI: https://doi.org/10.1016/j.tsf.2003.11.185

[5] S. Nagakura and T. kusunoki, Structure of TiNx studied by electron diffraction and microscopy, J. Appl. Cryst. (1977). 10, pp.52-56.

[6] Z. Ming, Z. Daming, Z. Gong, F. Ling and W. Minsheng(2005), A study on the Preparation of TiO2-xNx Films by Reactive Deposition and Their Absorption in visible Region, Material Science Forum Vols. 475-479 pp.1223-1226.

DOI: https://doi.org/10.4028/www.scientific.net/msf.475-479.1223

[7] N. Jiang, H.J. Zhang, S. N Bao, Y.G. Shen and Z.F. Zhou(2004), XPS study for reactively sputtered titanium nitride thin films deposited under different substrate bias, Physica, Vol. B352, pp.118-126.

DOI: https://doi.org/10.1016/j.physb.2004.07.001

[8] I. Bertoti(2002), Characteristics of nitride coating by XPS, Surface and Technology, Vol. 151152, pp.194-203.

[9] G. Soto(2004), AES, EELS and XPS characterization of Ti (C, N, O) films prepared by PLD using a Ti target in N2, CH4, O2 and CO as reactive gases, Applied Surface Science, Vol. 233, pp.115-122.

DOI: https://doi.org/10.1016/j.apsusc.2004.03.212

[10] J. Kim, H. Hong, K Oh, C. Lee(2003), Properties including step coverage of TiN thin films prepared by atomic layer deposition, Applied Surface Science, Vol. 210, pp.231-239.

DOI: https://doi.org/10.1016/s0169-4332(03)00158-2