The Properties of Low Pressure Chemical Vapor Deposited Boron Nitride Thin Films

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Periodical:

Materials Science Forum (Volumes 54-55)

Edited by:

J. J. Pouch and S. A. Alterovitz

Pages:

229-260

DOI:

10.4028/www.scientific.net/MSF.54-55.229

Citation:

S.S. Dana "The Properties of Low Pressure Chemical Vapor Deposited Boron Nitride Thin Films", Materials Science Forum, Vols. 54-55, pp. 229-260, 1990

Online since:

January 1991

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$35.00

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