Photocatalytic and Photoelectrochemical Properties of Nitrogen-Substituted TiO2 Thin Films Prepared by an RF Magnetron Sputtering Deposition Method
Highly nitrogen-substituted TiO2 (N-TiO2) thin film photocatalysts were prepared by a radio-frequency magnetron sputtering (RF-MS) deposition method. N-TiO2 thin films with low nitrogen concentration (0.5%) exhibited a small absorption band as a shoulder in the 400-500 nm wavelength region, indicating that isolated N 2p orbitals are formed above the O 2p orbitals. However, N-TiO2 with higher nitrogen concentration (6%) exhibited a sharp absorption edge at 500 nm, indicating that visible light absorption is due to a band gap transition. These N-TiO2 thin films could operate as photocatalysts to decompose 2-propanol diluted in water under visible light. The band structure of N-TiO2 was also determined by photoelectrochemical measurements and H2 and O2 evolution was carried out from an aqueous solution involving sacrificial reagents.
Hyungsun Kim, Junichi Hojo and Soo Wohn Lee
M. Kitano et al., "Photocatalytic and Photoelectrochemical Properties of Nitrogen-Substituted TiO2 Thin Films Prepared by an RF Magnetron Sputtering Deposition Method", Materials Science Forum, Vols. 544-545, pp. 107-110, 2007