Characterization and Wettability of TiO2 Films Deposited by Mid-Frequency Magnetron Reactive Sputtering

Abstract:

Article Preview

TiO2 films were deposited by using mid-frequency twin magnetron reactive sputtering technique at ambient temperature on quartz and Si wafer. The films were annealed after deposition. The phase composition and surface morphology of the TiO2 films were characterized by X-ray diffraction, Raman spectroscopy, and scanning electron microscopy, while the optical properties and contact angle were measured using a UV-Vis spectrophotometer and a contact angle meter. It is indicated that anatase phase dominates below 900°C and a mixture of rutile and anatase exists in the film annealed at 1000°C. Furthermore, the hydrophilic property depends on phase composition and morphological change in TiO2 films.

Info:

Periodical:

Materials Science Forum (Volumes 544-545)

Edited by:

Hyungsun Kim, Junichi Hojo and Soo Wohn Lee

Pages:

27-30

DOI:

10.4028/www.scientific.net/MSF.544-545.27

Citation:

Y. Cui et al., "Characterization and Wettability of TiO2 Films Deposited by Mid-Frequency Magnetron Reactive Sputtering", Materials Science Forum, Vols. 544-545, pp. 27-30, 2007

Online since:

May 2007

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.