Ti-Ca-P Films Formed by RF Magnetron Sputtering Method Using Dual Targets

Abstract:

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Ti-Ca-P films on commercial pure (cp) titanium plates were uniformly deposited using dual target RF magnetron sputtering apparatus with DC magnetron sputtering system under the conditions of 50 W DC power to a cp titanium target and 200 W RF power to a β-tricalcium phosphate (β-TCP) target for 60 min in 2.2×10-1 Pa Ar. Resulting samples had smooth surface like mirror. Crystal structure of the film was amorphous. The film had the chemical composition of about 3: 1.7: 1: 11 in Ti: Ca: P: O ratio under controlling the β-TCP target RF sputtering power and the titanium target DC sputtering power. The film and the method are expected to be useful for remodeling surfaces of various titanium implants.

Info:

Periodical:

Materials Science Forum (Volumes 544-545)

Edited by:

Hyungsun Kim, Junichi Hojo and Soo Wohn Lee

Pages:

495-498

DOI:

10.4028/www.scientific.net/MSF.544-545.495

Citation:

A. Watazu et al., "Ti-Ca-P Films Formed by RF Magnetron Sputtering Method Using Dual Targets", Materials Science Forum, Vols. 544-545, pp. 495-498, 2007

Online since:

May 2007

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Price:

$35.00

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