Investigation of Drain Current Saturation in 4H-SiC MOSFETs
Electronic measurement coupled with device and material modeling of lateral longchannel 4H-SiC MOSFETs is used to investigate current saturation. Observed increases in drain current with increases in temperature are shown to result from a reduction in interface charge trapping. If trapping is ignored, the saturation current is predicted to decrease with increasing temperature as a result of interface phonon scattering.
N. Wright, C.M. Johnson, K. Vassilevski, I. Nikitina and A. Horsfall
G. Pennington et al., "Investigation of Drain Current Saturation in 4H-SiC MOSFETs", Materials Science Forum, Vols. 556-557, pp. 811-814, 2007