Structural and Mechanical Properties of AlN Films by Pulsed Bias Arc Ion Plating

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AlN thin films have been deposited on p-(100) Si and glass substrates by pulsed bias arc ion plating at different negative substrate biases. The crystal orientation, deposition rate and mechanical property of the films were investigated by X-ray diffraction, nanoindenter and UV-VIS spectrophotometer. The results reveal that pulsed bias has a large influence on film preferred orientation, deposition rate and mechanical property. A preferred (110) orientation is observed in the film deposited at a bias of -50V. With the increase of the bias, film deposition rate decreases first sharply then wildly; Film hardness and elastic modulus first increase, then decrease and finally increases. Higher value of film harness obtained at the bias of -50V and -500V relates to the (110) preferred orientation and grain refinement respectively.

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Periodical:

Materials Science Forum (Volumes 561-565)

Main Theme:

Edited by:

Young Won Chang, Nack J. Kim and Chong Soo Lee

Pages:

1157-1160

Citation:

M. Zhang et al., "Structural and Mechanical Properties of AlN Films by Pulsed Bias Arc Ion Plating", Materials Science Forum, Vols. 561-565, pp. 1157-1160, 2007

Online since:

October 2007

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$38.00

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