Structural and Mechanical Properties of AlN Films by Pulsed Bias Arc Ion Plating


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AlN thin films have been deposited on p-(100) Si and glass substrates by pulsed bias arc ion plating at different negative substrate biases. The crystal orientation, deposition rate and mechanical property of the films were investigated by X-ray diffraction, nanoindenter and UV-VIS spectrophotometer. The results reveal that pulsed bias has a large influence on film preferred orientation, deposition rate and mechanical property. A preferred (110) orientation is observed in the film deposited at a bias of -50V. With the increase of the bias, film deposition rate decreases first sharply then wildly; Film hardness and elastic modulus first increase, then decrease and finally increases. Higher value of film harness obtained at the bias of -50V and -500V relates to the (110) preferred orientation and grain refinement respectively.



Materials Science Forum (Volumes 561-565)

Main Theme:

Edited by:

Young Won Chang, Nack J. Kim and Chong Soo Lee




M. Zhang et al., "Structural and Mechanical Properties of AlN Films by Pulsed Bias Arc Ion Plating", Materials Science Forum, Vols. 561-565, pp. 1157-1160, 2007

Online since:

October 2007




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