X-Ray Reflectivity Studies of Pt/AlN Multilayered Films


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Pt/AlN multilayered films fabricated by alternative sputtering deposition were characterized by X-Ray Reflectometry and X-Ray Diffraction. As-deposited films have (111) and (001) preferred orientation for Pt and AlN, respectively. The X-Ray Reflectivity profiles are assigned to the total reflection and Bragg reflections due to periodic layer structure. The Bragg peaks are observed at the 2Theta range beyond 15 degree and the peak intensities increase after annealing. The reflectivity of the first order Bragg reflection is approximately 65% and is stable after annealing at 873K. Simulation of the reflectivity profile has shown roughnesses of the Pt/AlN interfaces are below 0.4nm. X-Ray Diffraction revealed the development of film texture and formation of superlattice by annealing. The latter indicates periodicity of film is very high.



Materials Science Forum (Volumes 561-565)

Main Theme:

Edited by:

Young Won Chang, Nack J. Kim and Chong Soo Lee




T. Harumoto et al., "X-Ray Reflectivity Studies of Pt/AlN Multilayered Films", Materials Science Forum, Vols. 561-565, pp. 2095-2098, 2007

Online since:

October 2007




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