The article gives an overview of suitability of three kinds of phosphorus-containing glass systems: phosphate, alumosilicate phosphate and fluorophosphate for production of thick-films. Amorphous compositions based on metaphosphate glasses characterize high electric resistivity, thermal expansion coefficients matching with substrate, appropriate viscosity-temperature relationship, and suitable chemical reactivity, that they can be applied in thick-film technology for screen printed resistors on alumina substrate as an alternative of lead borosilicate glasses. Alumosilicate phosphate glasses are the base for the wide range of glass-crystalline high temperature materials (operating up to 10000C) for sealing of the silicon chip in microelectronics. Perfect adhesion of glass ceramics with substrate (the transition zone 5-7.5 μm) is provided by the formation of chemical bond with the oxidized surface of silicon and by the occurrence of analogous structural elements on the silicon surface and in the glass-ceramics. Due to the unique optical properties, low melting temperature of fluorine containing borophosphate glasses (FBP) can be used as brazing material (optical glue) for SiO2 glass optical fiber construction knots.