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Magneto-Transport in Stressed Si:B in the Localization Regime
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Shallow Copper-Related Complexes in P-Type Silicon
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Magneto-Transport in Stressed Si:B in the Localization Regime

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Periodical:

Materials Science Forum (Volumes 65-66)

Pages:

241-246

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.65-66.241

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Online since:

January 1991

Authors:

M. Stöhr, P. Janiszewski, J.A. Chroboczek

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© 1991 Trans Tech Publications Ltd. All Rights Reserved

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