A New Technology of Boron Diffusion into Silicon by Rapid Thermal Processing

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Periodical:

Materials Science Forum (Volumes 65-66)

Edited by:

Gordon Davies

Pages:

29-34

DOI:

10.4028/www.scientific.net/MSF.65-66.29

Citation:

W. Q. Shi et al., "A New Technology of Boron Diffusion into Silicon by Rapid Thermal Processing", Materials Science Forum, Vols. 65-66, pp. 29-34, 1991

Online since:

January 1991

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$35.00

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