Complete Determination of the Local Stress Field in Epitaxial Thin Films Using Single Microstructure

Abstract:

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In this article, using finite element simulations and analytical approaches, we demonstrate that planar rotators[1] can be effectively used to determine both the uniform and gradient residual stresses in thin films with higher accuracy compared to other microstructures.

Info:

Periodical:

Materials Science Forum (Volumes 679-680)

Edited by:

Edouard V. Monakhov, Tamás Hornos and Bengt. G. Svensson

Pages:

213-216

DOI:

10.4028/www.scientific.net/MSF.679-680.213

Citation:

M. Camarda et al., "Complete Determination of the Local Stress Field in Epitaxial Thin Films Using Single Microstructure", Materials Science Forum, Vols. 679-680, pp. 213-216, 2011

Online since:

March 2011

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Price:

$35.00

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