The Effect of Target to Substrate Distance on the Properties of HAZO Films Deposited by Magnetron Sputtering

Abstract:

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Hydrogen doped AZO films (HAZO) were prepared by RF magnetron sputtering. A systematic study of the effect of substrate to target distance (Dst) on the structural, electrical and optical properties of the as-grown HAZO films was carried out. Compared with the Al-doped ZnO films, the hydrogen in the atmosphere influenced the growth of the films by incorporating in the films and bombarding the surface of the film, namely, the Dst, which induced the residual stress and the roughness of the films decreased with an increase of the Dst. The films showed a smaller grain size. The surface work function of the films changed with the composition of the films, reaching a maximum at 7.5cm.

Info:

Periodical:

Edited by:

Kunyuan Gao, Shaoxiong Zhou, Xinqing Zhao

Pages:

134-140

DOI:

10.4028/www.scientific.net/MSF.685.134

Citation:

W. M. Lu et al., "The Effect of Target to Substrate Distance on the Properties of HAZO Films Deposited by Magnetron Sputtering", Materials Science Forum, Vol. 685, pp. 134-140, 2011

Online since:

June 2011

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$35.00

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