Study on Copper Nitride Thin Films Prepared by Reactive DC Magnetron Sputtering

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Copper nitride thin films were deposited on glass substrates by reactive DC magnetron sputtering at various N2-gas flow rates and different substrate temperature. X-ray diffraction measurements show that the films are composed of Cu3N crystallites with anti-ReO3 structure and exhibit preferential orientation to the [111] and [100]. The preferred crystalline orientation of the films changes with the N2-gas flow rate and substrate temperature. The N2-gas flow rate and the substrate temperature not only affect the crystal structure of films but also affect the deposition rate, the resistivity and the microhardness of the Cu3N films.

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Periodical:

Edited by:

Chengming Li, Chengbao Jiang, Zhiyong Zhong and Yichun Zhou

Pages:

706-710

DOI:

10.4028/www.scientific.net/MSF.687.706

Citation:

X. A. Li et al., "Study on Copper Nitride Thin Films Prepared by Reactive DC Magnetron Sputtering", Materials Science Forum, Vol. 687, pp. 706-710, 2011

Online since:

June 2011

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$35.00

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