Study on Copper Nitride Thin Films Prepared by Reactive DC Magnetron Sputtering


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Copper nitride thin films were deposited on glass substrates by reactive DC magnetron sputtering at various N2-gas flow rates and different substrate temperature. X-ray diffraction measurements show that the films are composed of Cu3N crystallites with anti-ReO3 structure and exhibit preferential orientation to the [111] and [100]. The preferred crystalline orientation of the films changes with the N2-gas flow rate and substrate temperature. The N2-gas flow rate and the substrate temperature not only affect the crystal structure of films but also affect the deposition rate, the resistivity and the microhardness of the Cu3N films.



Edited by:

Chengming Li, Chengbao Jiang, Zhiyong Zhong and Yichun Zhou






X. A. Li et al., "Study on Copper Nitride Thin Films Prepared by Reactive DC Magnetron Sputtering", Materials Science Forum, Vol. 687, pp. 706-710, 2011

Online since:

June 2011




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