Structure and Mechanical Properties of AlCrN Thin Films Deposited by Magnetron Sputtering
A magnetron sputtering system was used to deposit AlCrN thin films. Chemical compositions of the films were determined by both EDXS and RBS, while structures analyses were conducted by XRD in a Seifert XRD3000 diffractometer. Macroscopic residual stresses of films were determined by curvature measurements using DEKTAK IIA profilometer, while in-grain stresses were extracted by the “sin²Y method” from XRD measurements. A nanoindenter from CSM (Switzerland) was used to determine the hardness of the films. A CrN type FCC structure was obtained with a strong (200) fiber texture for the range of compositions Al1-xCrxNy (0.56 < x< 0.89) of interest here. The global stresses were compressive for all FCC films resulting from the high energetic deposition conditions used. In-grain compressive stresses were determined for the films with thickness < 500nm, while thicker films (> 500nm) showed tensile in-grain stresses. Stress-free lattice parameter a0 strongly decreased from 4.13 to 3.97 A°. Hardness values were obtained in a range extending from 17 to 27 GPa with an increase obtained as Cr content increases and correlated to the residual-stress level.
Hyungsun Kim, Jian Feng Yang, Chuleol Hee Han, Somchai Thongtem and Soo Wohn Lee
T.T.H. Pham et al., "Structure and Mechanical Properties of AlCrN Thin Films Deposited by Magnetron Sputtering", Materials Science Forum, Vol. 695, pp. 182-185, 2011