Raman Characterisation of Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition
Simple and up-scalable production of carbon nanotubes (CNTs) still remains difficult with current production methods. Plasma enhanced chemical vapour deposition (PECVD) provides an excellent method for producing high purity and large amounts of carbon nanotubes. This work demonstrates how PECVD can be used to tailor the required properties in the resultant nanotubes produced. By altering only one of the growth variables the resultant CNTs can be altered from single-walled to multi-walled. This was achieved by altering the growth temperature from 450-650°C, altering the growth time and altering the underlying catalyst and supporting layer. High purity SWCNT and MWCNT could be produced and easily distinguished leading to a wide range of applications.
B. J. Ruck and T. Kemmitt
M. A. Bissett et al., "Raman Characterisation of Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition", Materials Science Forum, Vol. 700, pp. 112-115, 2012