Argon Plasma Decomposition of Porogen in Mesoporous Silica Films Studied by Positron Annihilation


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Mesoporous silica films on Si wafers were prepared via a sol-gel process using a triblock copolymer as the structural template. Spin-coated films were dried and subsequently subjected to Ar plasma treatments for decomposing the polymeric porogen. Mesopore formation in the silica film upon Ar plasma treatments was investigated by positron annihilation lifetime spectroscopy. In comparison with calcined silica film, much larger pores, more heterogeneous in size were found in silica film prepared with Ar plasma decomposition of the porogen.



Edited by:

Jozef Krištiak, Jan Kuriplach and Pradeep K. Pujari




C. Q. He et al., "Argon Plasma Decomposition of Porogen in Mesoporous Silica Films Studied by Positron Annihilation", Materials Science Forum, Vol. 733, pp. 193-196, 2013

Online since:

November 2012




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