Two-Dimensional Carrier Profiling on Lightly Doped n-Type 4H-SiC Epitaxially Grown Layers


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Electronically active dopant profiles of epitaxially grown n-type 4H-SiC calibration layer structures with concentrations ranging from 3.1015 cm-3 to 1·1019 cm-3 have been investigated by non-contact Scanning Probe Microscopy (SPM) methods. We have shown that Kelvin Probe Force Microscopy (KPFM) and Electrostatic Force Microscopy (EFM) are capable of resolving two-dimensional carrier maps in the low doping concentration regime with nanoscale spatial resolution. Furthermore, different information depths of this wide band gap semiconductor material could be assessed due to the inherent properties of each profiling method. We additionally observed a resolution enhancement under laser illumination which we explain by reduced band-bending conditions. To gauge our SPM signals, we utilized epitaxially grown layers which were calibrated, in terms of dopant concentration, by C-V measurements.



Materials Science Forum (Volumes 821-823)

Edited by:

Didier Chaussende and Gabriel Ferro




H.R. Rossmann et al., "Two-Dimensional Carrier Profiling on Lightly Doped n-Type 4H-SiC Epitaxially Grown Layers", Materials Science Forum, Vols. 821-823, pp. 269-272, 2015

Online since:

June 2015




* - Corresponding Author

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