Production and Characterization of Carbon Thin Films by the Magnetron Sputtering Technique
Carbon thin films were produced by the magnetron sputtering technique. The deposition of the carbon films was performed on Co buffer-layers previously deposited on c-plane (0001) sapphire substrates. The samples were thermally treated under vacuum conditions and characterized by Raman spectroscopy, scanning electron microscopy (SEM) and X-ray diffraction (XRD). The XRD peak related to the carbon film was observed and the Raman spectroscopy indicated a good degree of crystallinity of the carbon film.
Fernando dos Santos Ortega
D.L.C. Silva et al., "Production and Characterization of Carbon Thin Films by the Magnetron Sputtering Technique", Materials Science Forum, Vol. 881, pp. 471-474, 2017