Production and Characterization of Carbon Thin Films by the Magnetron Sputtering Technique

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Carbon thin films were produced by the magnetron sputtering technique. The deposition of the carbon films was performed on Co buffer-layers previously deposited on c-plane (0001) sapphire substrates. The samples were thermally treated under vacuum conditions and characterized by Raman spectroscopy, scanning electron microscopy (SEM) and X-ray diffraction (XRD). The XRD peak related to the carbon film was observed and the Raman spectroscopy indicated a good degree of crystallinity of the carbon film.

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Edited by:

Fernando dos Santos Ortega

Pages:

471-474

DOI:

10.4028/www.scientific.net/MSF.881.471

Citation:

D.L.C. Silva et al., "Production and Characterization of Carbon Thin Films by the Magnetron Sputtering Technique", Materials Science Forum, Vol. 881, pp. 471-474, 2017

Online since:

November 2016

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