TCAD Modeling of a 1200 V SiC MOSFET
In this work, TCAD modeling of a 1200 V SiC MOSFET is presented. The main focus is on modeling of the channel mobility, and the Coulomb scattering by interface traps and surface roughness are therefore included. For the Coulomb scattering, the interface trap profiles have been extrapolated from the subthreshold characteristics at room temperature, whereas the scattering due to surface roughness has been fitted by comparing to the transfer characteristics at high gate bias. A comparison with measurements for the transfer characteristic and the output characteristic is also presented. Results show that the reduction of the threshold voltage with increasing temperature and the temperature dependence of the output characteristics are properly modeled.
Robert Stahlbush, Philip Neudeck, Anup Bhalla, Robert P. Devaty, Michael Dudley and Aivars Lelis
K. Lee et al., "TCAD Modeling of a 1200 V SiC MOSFET", Materials Science Forum, Vol. 924, pp. 689-692, 2018