Effect of Chemical Solution on the Stability of Low-k Films
The compatibility of chemical solutions with different pH is studied on microporous silica-based (SiOCH) and mesoporous methylsilsesquioxane (MSQ) based low-k materials. The surface and bulk properties of as-deposited and O2/CF4 plasma-treated low-k films have been studied after several wet treatments.
Paul Mertens, Marc Meuris and Marc Heyns
E. Kesters et al., "Effect of Chemical Solution on the Stability of Low-k Films", Solid State Phenomena, Vols. 103-104, pp. 349-352, 2005