Etching of Silicon Dioxide with Gas Phase HF and Water: Initiation, Bulk Etching, and Termination.

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

3-6

DOI:

10.4028/www.scientific.net/SSP.134.3

Citation:

G. Montaño-Miranda and A. Muscat, "Etching of Silicon Dioxide with Gas Phase HF and Water: Initiation, Bulk Etching, and Termination.", Solid State Phenomena, Vol. 134, pp. 3-6, 2008

Online since:

November 2007

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$35.00

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