Ultra Clean Processing of Semiconductor Surfaces VIII
Paper Title Page
Abstract: Megasonic cleaning using de-gassed water (less than 2ppm N2, O2, CO2) in a 300mm batch immersion tool often does not give optimal particle...
Abstract: In order to obtain high yields during IC manufacturing, particles - added during layer deposition, etching … - have to be removed. In order...
Abstract: T type megasonic waveguide was analyzed by finite element method (FEM), acoustic pressure measurements and particle removal efficiency for...
Abstract: The local particle removal efficiency (PRE) of nano particles in megasonic cleaning experiments is studied. This approach makes it possible...
Abstract: Ozonated DI water was supplied to make alkaline cleaning solutions to replace SC1 chemicals in a bath with and without recirculation. With...