Ultra Clean Processing of Semiconductor Surfaces VIII

Volume 134

doi: 10.4028/www.scientific.net/SSP.134

Paper Title Page

Authors: Boon Cheng Goh, Felicia Goh, Christopher Lim, Zainab Ismail, Mei Sheng Zhou

Abstract: Megasonic cleaning using de-gassed water (less than 2ppm N2, O2, CO2) in a 300mm batch immersion tool often does not give optimal particle...

Authors: Kurt Wostyn, Vincent Quenette, Guy Vereecke, Paul W. Mertens

Abstract: In order to obtain high yields during IC manufacturing, particles - added during layer deposition, etching … - have to be removed. In order...

Authors: Bram Borkent, Nicolas Bremond, Manish Arora, Claus Dieter Ohl, Detlef Lohse
Authors: Yang Lae Lee, Eui Su Lim, Kook Jin Kang, Hyun Se Kim, Tae Gon Kim, Sang Ho Lee, Jin Goo Park

Abstract: T type megasonic waveguide was analyzed by finite element method (FEM), acoustic pressure measurements and particle removal efficiency for...

Authors: Tom Janssens, Frank Holsteyns, Karine Kenis, Sophia Arnauts, Twan Bearda, Kurt Wostyn, Gavin Simpson, Andy Steinbach, Paul W. Mertens

Abstract: The local particle removal efficiency (PRE) of nano particles in megasonic cleaning experiments is studied. This approach makes it possible...

Authors: Seung Ho Lee, Tae Gon Kim, Tae Young Kwon, Jin Goo Park, So Ik Bae, Gun Ho Lee, In Jung Kim

Abstract: Ozonated DI water was supplied to make alkaline cleaning solutions to replace SC1 chemicals in a bath with and without recirculation. With...

Authors: Kenichi Sano, Frederik E. Leys, G. Dilliway, Roger Loo, Paul W. Mertens, James Snow, Akira Izumi, Atsuro Eitoku
Authors: Yannick Borde, Adrien Danel, A. Roche, A. Grouillet, Marc Veillerot
Authors: Dong Won Hwang, Jae Seok Lee, Pil Kwon Jun, Yang Ku Lee, Seung Ki Chae

Showing 51 to 60 of 89 Paper Titles