Ultra Clean Processing of Semiconductor Surfaces VIII

Volume 134

doi: 10.4028/www.scientific.net/SSP.134

Paper Title Page

Authors: Jae Gon Choi, Hyo Geun Yoon, Woo Jin Kim, Geun Min Choi, Young Wook Song, Jin Goo Park
Authors: Jae Woo Nam, Andrey Zagrebelny, Roc Blumenthal, Joy Block, Miranda Duray, Brian Aegerter
Authors: A.M. Urbanowicz, A. Humbert, G. Mannaert, Z. Tokei, Mikhail R. Baklanov
Authors: Diane Rébiscoul, Lucile Broussous, N. Lopez, A. Roman, R. Kachtouli, L.G. Gosset, J. Guillan, Didier Louis, G. Passemard
Authors: Martine Claes, Quoc Toan Le, J. Keldermans, Els Kesters, Marcel Lux, A. Franquet, Guy Vereecke, Paul W. Mertens, M.M. Frank, Robert Carleer, P. Adriaensens, D. Vanderzande
Authors: Jennie Macdougall, Chris Reid, Larry McGhee

Abstract: The time and stoichiometric ratio dependence on dissolution of Cu from Cu(I)O and Cu(II)O and metallic Cu was investigated for a series of...

Authors: Diane Rébiscoul, N. Lopez, Lucile Broussous, Didier Louis, G. Passemard
Authors: Jian She Tang, Wei Lu, Bo Xi, Eli Martinez, Fred Li, Alex Ko, Craig Todd, John T.C. Lee

Abstract: To address the water mark issue from hydrophobic film drying, and the stringent particle removal requirements for the 45nm technology node...

Authors: H. Kiyose, K. Saito, I. Mizobata, T. Iwata, S. Hirae, Koichiro Saga, Hitoshi Kuniyasu, Takeshi Hattori

Showing 71 to 80 of 89 Paper Titles