Defects distribution in 6H-SiC implanted with Bi ions was investigated with the local cathodoluminescence. There are two typical areas with radiation defects found in implanted samples. Implanted layer was about 27 micrometers depth. Far-action area with radiation defects was observed for the first time. Thickness of this area varies from few tens up to hundreds micrometers. This effect depended on concentration of defects i.e. irradiation fluence. Radiation defects at this area disappeared after annealing the sample if fluence is not to high.