The Characteristic of the Multilayer Thin Films by X-Ray Reflectometry Method


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The X-ray reflectometry (XR), as a non-destructive method, is a powerful tool in obtaining information about parameters of thin films such as thickness, average density and interface roughness. In this paper Cu/Au, Au/Cu and Cu/Ag multilayer thin films (where the total thickness is less then 1000Å) are presented. The multilayer films are obtained by thermal evaporation in a UHV system, on the silicon substrate. The experimental XR curves contained critical angle and classical Kiessig’s fringes. For these materials the density (), the thickness () and interface roughness () information for every layer separately were calculated. The experimental reflectometry curves were analyzed using the WinGixa programme X’Pert software. The values of layer density show that they are reached in neighbor density and it is connected with the creation of the Cu-Au or Ag-Cu interlayer reached into Cu, Au or Ag, respectively. The analysis of roughness show that there are comparable to roughness of substrate only for 2-3 first layers. Further the roughness of Cu, Au, Ag layers are increasing. The comparison of results show that increasing of Ag an Au roughness is bigger than Cu.



Solid State Phenomena (Volume 163)

Edited by:

Danuta Stróż & Małgorzata Karolus




B. Bierska-Piech et al., "The Characteristic of the Multilayer Thin Films by X-Ray Reflectometry Method", Solid State Phenomena, Vol. 163, pp. 80-83, 2010

Online since:

June 2010




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