Defect Engineering in 2D Photonic Crystals Fabricated by Electrochemical Etching of Silicon

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We propose electro-tunable composite structure of microcavity based on silicon 2D photonic crystal bar with a trench defect infiltrated with a liquid crystal. The device is fabricated by joint photo-electrochemical etching of deep macropores and trenches with subsequent trench opening from the substrate side. The optimized geometry and etching regime enables to minimize the lattice distortion introduced by trenches and to reduce roughness of the trench side walls. It was demonstrated that the structures with reach- through trenches and dead-end macropores are suitable for selective filling with a liquid crystal.

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Periodical:

Solid State Phenomena (Volumes 178-179)

Edited by:

W. Jantsch and F. Schäffler

Pages:

459-464

Citation:

E. V. Astrova et al., "Defect Engineering in 2D Photonic Crystals Fabricated by Electrochemical Etching of Silicon", Solid State Phenomena, Vols. 178-179, pp. 459-464, 2011

Online since:

August 2011

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$38.00

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