Development of a Near-Field Megasonic Cleaning System for Nano-Particle Removal

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A near-field megasonic system for cleaning semiconductors was designed and fabricated. For the design of the near-field megasonic system, an impedance characteristic of a quartz megasonic waveguide with the piezoelectric actuator was analyzed using a finite element method (FEM). The analysis result showed that the anti-resonance frequency of the system was 982 kHz, which agreed well with the measured value of 988 kHz. The performance of the developed system was assessed by measuring acoustic pressures and comparing the maximim values of them with a conventional megasonic system. As a result, the maximim acoustic pressure of the developed system was decreased by 46.2% compared to the commercial system. Finally, the particle removal efficiency (PRE) test was performed and the obtained PRE was 90.8%. Theses results explain that the developed megasonic has an improved uniformity of the acoustic pressures, which can raise the energy efficiency of the system and lowering the consumption of chemical and ultra pure water (UPW).

Info:

Periodical:

Solid State Phenomena (Volume 195)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

205-208

Citation:

H. S. Kim et al., "Development of a Near-Field Megasonic Cleaning System for Nano-Particle Removal", Solid State Phenomena, Vol. 195, pp. 205-208, 2013

Online since:

December 2012

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$38.00

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