Ultra Clean Processing of Semiconductor Surfaces XII

Volume 219

doi: 10.4028/www.scientific.net/SSP.219

Info:

Ultra Clean Processing of Semiconductor Surfaces XII
ISBN-13:
978-3-03835-242-6
Authors / Editors:
Paul Mertens, Marc Meuris and Marc Heyns
Pages:
350
Year:
2015
Edition:
Softcover

Description:

Collection of selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium.
The 71 papers are grouped as follows:
Chapter 1: Cleaning for FEOL Applications,
Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area,
Chapter 3: Wet Etching for FEOL Applications,
Chapter 4: Wet Processing of High Aspect Ratio Structures,
Chapter 5: Fluid Dynamics, Cleaning Mechanics,
Chapter 6: Photo Resist Performance and Rework,
Chapter 7: Cleaning for BEOL Interconnect Applications,
Chapter 8: Cleaning for 3D Applications,
Chapter 9: Contamination Control and AMC,
Chapter 10: Cleaning and Wet Etching for Semiconductor Photo-Voltaic Cells

Keyword: Ultra-cleaning, precision cleaning, wet cleaning, Semiconductor Surfaces, contamination control, surface impurities, surface defects, Integrated circuits, Micro-electronic structures, photovoltaic processing, proceedings UCPSS

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